IEEE SCV-Photonics Chapter Monthly Technical Meeting on June 2, 2009

Date: Tuesday, June 2, 2009

6:00pm: Networking/Pizza Social
7:00pm: Presentation
8:00pm: Adjourn

Location: National Semiconductor Building E Auditorium

Cost: Free



Where in the nano-world is lithography taking us?


Dr. Harry J. Levinson, GLOBALFOUNDRIES


For decades, patterns of integrated circuits have been fabricated using optical lithography using near- to deep-ultraviolet light. However, this method is approaching fundamental physical limits, in terms of the ability to print dense patterns directly. The reasons for this are described, and the outlook for some of the alternatives currently being serious consideration, such as double patterning and extreme ultraviolet (EUV) lithography, are discussed. Included in the discussion will be economic as well as technical issues.


Harry J. Levinson is a Sr. Fellow and manager of GLOBALFOUNDRIES's Strategic Lithography Technology Department, which is responsible for advanced lithographic processes and equipment. Dr. Levinson started his career in Bipolar Memory Development at AMD, then spent some time at Sierra Semiconductor and IBM, before returning to AMD - now GLOBALFOUNDRIES - in 1994. During the course of his career, Dr. Levinson has applied lithography to many different technologies, including bipolar memories, 64Mb and 256Mb DRAM development, the manufacturing of applications-specific integrated circuits, thin film heads for magnetic recording, flash memories and advanced logic. He was one of the first users of 5 steppers in Silicon Valley and was an early participant in 248 nm and 193 nm lithography. Dr. Levinson also served for several years as the chairman of the USA Lithography Technology Working Group that participates in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of two books, Lithography Process Control and Principles of Lithography. He holds over 40 US patents. Dr. Levinson is an SPIE Fellow and chairs the SPIE Publications Committee. He has a BS in engineering from Cornell University and a PhD in Physics from the University of Pennsylvania.

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